RISETRON NX

This home-use Ultrashort wave treatment device is intended for deep heating treatment of tissue. The device irradiates targeted areas of the body using high frequency electromagnetic energy between 13MHz and 2,450Mhz. RISETRON NX utilizes a frequency of 27.12MHz, which is within the scope intended for medical use.

Ultrashort wave vibrate the tissue at a high frequency of 27,000,000 times a second. RISETRON NX provides warming effects, heating the muscle of the targeted area not just heating the skin. When the probe comes into contact with the targeted area, it irradiates it with 27.12MHz of electromagnetic energy, treating the area through these heating effects.

RISETRON NX utilizes a probe with a small output area rather than a cover type, in which the ultrashort waves hit a wide range of the body. The device moves about freely, allowing the user to move the probe to the area of concern, rather than targeting the entire body.

The long, curved probe can be used to easily treat the shoulders, back, and other places that cannot be easily reached by hand. The device can even provide treatment over a thin piece of clothing, which is incredibly convenient as it allows for immediate use whenever necessary.

This type of probe can be used across a wide area, including on legs and the abdomen, and can treat difficult-to-reach areas such as the knees. In addition, when treating two people at a time, it can also be used to treat areas such as the back. Provides treatment with a gentle touch.

Begin operating by simply powering the device on and pressing the start button. Then just adjust the strength and set the timer. The buttons are also large and easy-to-understand, making operation easy.

The large LCD display allows for quick confirmation of device status, such as the remaining time on the timer, what kind of treatment is being carried out, and more.

Includes burn protection functions, over power controls, and probe movement detection. In addition, the device undergoes a strict quality control inspection at the factory.